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Effects of Thermal Annealing and Film Thickness on the Structural and Morphological Properties of Titanium Dioxide Films
(Polish Acad Sciences Inst Physics, 2012)
Titanium dioxide (TiO2) thin films having different thicknesses of 220, 260, and 300 nm were deposited onto well-cleaned n-type silicon substrates by reactive DC magnetron sputtering and annealed in the range of 200-1000 ...
Optimal wind-hydro solution for the Marmara region of Turkey to meet electricity demand (vol 36, pg 864, 2011)
(Pergamon-Elsevier Science Ltd, 2012)
[Abstract Not Available]